The global photoresist and photoresist ancillaries market size is estimated to be USD 3.3 billion in 2020 and projected to reach USD 4.2 billion by 2025, at a CAGR of 4.8%. A photoresist is a light-sensitive material applied to a substrate during photolithography or photoengraving to enable the desired pattern to be imaged, i.e., a properly exposed and developed photoresist masks portions of the substrate with extremely high precision. The growing semiconductor demand and upcoming nanoelectromechanical systems (NEMS) are expected to drive the photoresist and photoresist ancillaries market.
Semiconductors are the devices made from materials that conduct under specific conditions. ICs are the smaller version of circuit boards consisting of thousands of small electronic components such as resistors, capacitors, and transistors. ICs are used in numerous electronic devices, including smartphones, mobile devices, PCs & laptops, tablets, and advanced gaming devices. The continuously increasing demand for the cutting edge chips and ICs due to the upcoming trends such as 5G, AI, and IoT is driving the market for photoresist and photoresist ancillaries in this application.
The leading players in the global photoresist and photoresist ancillaries market includes Tokyo Ohka Kogyo Co., Ltd (Japan), JSR Corporation (Japan), DuPont (US), Shin-Etsu Chemical Co., Ltd (Japan), Fujifilm Corporation (Japan), Sumitomo Chemical Co., Ltd. (Japan), ALLRESIST (Germany), Merck Group (Germany), Micro Resist Technology (Germany), and DJ MicroLaminates (US).
