According to the latest report by IMARC Group, titled, “Photomask Market: Global Industry Trends, Share, Size, Growth, Opportunity and Forecast 2021-2026“,The global photomask market Size of US$ XX Billion in 2020. Looking forward, IMARC Group expects the market to grow at a CAGR of XX% during 2021-2026.
A photomask refers to a tool used for transferring images by displaying or writing patterns on a chrome-plated device. Itincludes hard and transparent substrates, such as fused silica and glass,with an opaque surface layer for etching microscopic patterns. The photomasks are placed adjacent to silicon wafers coated with photoresist materials to generate the desired pattern through opaque and transparent regions. They are extensively used for microlithographic processes in micro-electro-mechanical systems and integrated circuits (ICs). In comparison to the traditionally used transistors, photomasks are more compact, accurate and cost-effective.
As the novel coronavirus (COVID-19) crisis takes over the world, we are continuously tracking the changes in the markets, as well as the industry behaviours of the consumers globally and our estimates about the latest market trends and forecasts are being done after considering the impact of this pandemic.
Photomask Market Trends:
The global photomask market is primarily being driven by the increasing demand for semiconductors for the manufacturing process of electronics, smartphones, wearables and automated systems. Moreover, various product innovations, such as the development of next-generation extreme ultraviolet (EUV) photomasks for advanced semiconductors, are favoring the growth of the market. These novel variants are integrated with driverless automobiles to minimize unwanted reflection of light to the peripheral sections. Other factors, including the increasingadoption of the photomask in the defense industry for improving the existingmilitary and weaponry systems, along with the widespread product utilization in the manufacturingof medical and biomedical products, are creating a positive outlook for the market.
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Photomask Market 2021-2026 Analysis and Segmentation:
Competitive Landscape:
The competitive landscape of the market has been studied in the report with the detailed profiles of the key players operating in the market.
Advance Reproductions Corp., Applied Materials Inc., HOYA Corporation, Infinite Graphics Incorporated, KLA Corporation, LG Innotek Co. Ltd, Mycronic AB (publ), Nippon Filcon Co. Ltd., Photronics Inc., SK-Electronics Co. Ltd., Taiwan Mask Corporation and Toppan Printing Co. Ltd.
The report has segmented the market on the basis on product, mask shop type and application.
Breakup by Product:
Reticle
Master
Others
Breakup by Mask Shop Type:
Captive
Merchant
Breakup by Application:
Optical Devices
Discrete Components
Displays
MEMS
Others
Breakup by Region:
North America: (United States, Canada)
Asia Pacific: (China, Japan,India, South Korea, Australia, Indonesia, Others)
Europe: (Germany, France,United Kingdom, Italy, Spain, Russia, Others)
Latin America: (Brazil, Mexico, Others)
Middle East and Africa
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Key highlights of the report:
Market Performance (2015-2020)
Market Outlook (2021- 2026)
Porter’s Five Forces Analysis
Market Drivers and Success Factors
SWOT Analysis
Value Chain
Comprehensive Mapping of the Competitive Landscape
If you need specific information that is not currently within the scope of the report, we can provide it to you as a part of the customization.
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